Evaluation of the Boron activation and depth distribution using BBr2+ implants

SH Winston; RM Gwilliam; BJ Sealy; G Boudreault; C Jeynes; RP Webb; KJ Kirkby

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Evaluation of the Boron activation and depth distribution using BBr2+ implants

SH Winston, RM Gwilliam, BJ Sealy, G Boudreault, C Jeynes, RP Webb and KJ Kirkby

IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.115-118

14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)

01/01/2003

Abstract

Science & Technology

Technology

Physical Sciences

Engineering

Manufacturing

Engineering

Electrical & Electronic

Physics

Applied

Physics

Condensed Matter

Engineering

Physics

boron

silicon

B+

BF2+

BBr2+

electrical activation

SILICON

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Title: Evaluation of the Boron activation and depth distribution using BBr2+ implants
Creators: SH Winston
RM Gwilliam
BJ Sealy
G Boudreault
C Jeynes
RP Webb
KJ Kirkby
Contributors: B Brown
TL Alford
M Nastasi
MC Vella
IEEE (Publisher)
Publication Details: IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.115-118
Conference: 14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)
Date published: 01/01/2003
Date submitted: 17/05/2017
Identifiers: 99514284102346
Academic Unit: University of Surrey
Resource Type: Conference presentation

Evaluation of the Boron activation and depth distribution using BBr2+ implants

Abstract

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