Evaluation of BBr2+ and B++Br+ implants in silicon

JA Sharp; RM Gwilliam; BJ Sealy; C Jeynes; JJ Hamilton; KJ Kirkby

doi:10.1016/j.mseb.2005.08.065

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Evaluation of BBr2+ and B++Br+ implants in silicon

Conference presentation

Peer reviewed

Evaluation of BBr2+ and B++Br+ implants in silicon

JA Sharp, RM Gwilliam, BJ Sealy, C Jeynes, JJ Hamilton and KJ Kirkby

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, Vol.124, pp.196-199

Symposium on Materials Science and Device Issues for Futrue Si-Based Technologies held at the 2005 EMRS Meeting (Strasbourg, FRANCE, 31/05/2005 - 03/06/2005)

05/12/2005

DOI: https://doi.org/10.1016/j.mseb.2005.08.065

Abstract

Science & Technology

Technology

Physical Sciences

Materials Science

Multidisciplinary

Physics

Condensed Matter

Materials Science

Physics

boron

Rutherford backscattering spectroscopy

silicon

Hall effect

BORON

FLUORINE

SI

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Title: Evaluation of BBr2+ and B++Br+ implants in silicon
Creators: JA Sharp
RM Gwilliam
BJ Sealy
C Jeynes
JJ Hamilton
KJ Kirkby
Contributors: ELSEVIER SCIENCE SA (Publisher)
Publication Details: MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, Vol.124, pp.196-199
Conference: Symposium on Materials Science and Device Issues for Futrue Si-Based Technologies held at the 2005 EMRS Meeting (Strasbourg, FRANCE, 31/05/2005 - 03/06/2005)
Date published: 05/12/2005
Date submitted: 17/05/2017
Identifiers: 99513430502346
Academic Unit: University of Surrey
Resource Type: Conference presentation

Evaluation of BBr2+ and B++Br+ implants in silicon

Abstract

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