Elemental analysis of residual deposits in an ion implanter using IBA techniques

J Mefo; KJ Kirkby; BJ Sealy; G Boudreault; C Jeynes; EJH Collart

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Elemental analysis of residual deposits in an ion implanter using IBA techniques

J Mefo, KJ Kirkby, BJ Sealy, G Boudreault, C Jeynes and EJH Collart

IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.467-470

14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)

01/01/2003

Abstract

Science & Technology

Technology

Physical Sciences

Engineering

Manufacturing

Engineering

Electrical & Electronic

Physics

Applied

Physics

Condensed Matter

Engineering

Physics

ion beam analysis

RBS

EBS

NRA

ion implantation

flakes

residual deposits

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Title: Elemental analysis of residual deposits in an ion implanter using IBA techniques
Creators: J Mefo
KJ Kirkby
BJ Sealy
G Boudreault
C Jeynes
EJH Collart
Contributors: B Brown
TL Alford
M Nastasi
MC Vella
IEEE (Publisher)
Publication Details: IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.467-470
Conference: 14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)
Date published: 01/01/2003
Date submitted: 17/05/2017
Identifiers: 99510942802346
Academic Unit: University of Surrey
Resource Type: Conference presentation

Elemental analysis of residual deposits in an ion implanter using IBA techniques

Abstract

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