Charged particle energy spectrometers and their applications in fundamental studies of wafer charging and ion beam tuning phenomena

Conference presentation

Peer reviewed

Jonathan England, C. Cook, D. Armour and M. Foad

Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994

Ion Implantation Technology 94 (IIT 94) (Catania, Italy, 13/06/1994 - 17/06/1994)

16/05/1995

Abstract

url

https://www.elsevier.com/books/ion-implantation-technology-94/coffa/978-0-444-82194-2View

Published (Version of record)

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Title: Charged particle energy spectrometers and their applications in fundamental studies of wafer charging and ion beam tuning phenomena
Creators: Jonathan England
C. Cook
D. Armour
M. Foad
Contributors: S. Coffa
G. Ferla
E. Rimini
F. Priolo
Publication Details: Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994
Conference: Ion Implantation Technology 94 (IIT 94) (Catania, Italy, 13/06/1994 - 17/06/1994)
Date published: 16/05/1995
Date submitted: 15/06/2017
Identifiers: 99515342602346
Academic Unit: School of Computer Science and Electronic Engineering
Resource Type: Conference presentation