Absolute dose performance of the SWIFT single wafer ion implanter

G Claudio; G Boudreault; C Jeynes; BJ Sealy; R Low; B Brown; TL Alford; M Nastasi; MC Vella

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Absolute dose performance of the SWIFT single wafer ion implanter

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Absolute dose performance of the SWIFT single wafer ion implanter

G Claudio, G Boudreault, C Jeynes, BJ Sealy, R Low, B Brown, TL Alford, M Nastasi and MC Vella

IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.237-239

14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)

01/01/2003

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Title: Absolute dose performance of the SWIFT single wafer ion implanter
Creators: G Claudio
G Boudreault
C Jeynes
BJ Sealy
R Low
B Brown
TL Alford
M Nastasi
MC Vella
Contributors: IEEE (null)
Publication Details: IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.237-239
Conference: 14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)
Date published: 01/01/2003
Date submitted: 27/05/2010
Identifiers: 99512076202346
Academic Unit: School of Computer Science and Electronic Engineering
Resource Type: Conference presentation

Absolute dose performance of the SWIFT single wafer ion implanter

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