A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films

RUA Khan; AP Burden; SRP Silva; JM Shannon; BJ Sealy

doi:10.1016/S0008-6223(98)00269-3

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A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films

Conference presentation

Peer reviewed

A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films

RUA Khan, AP Burden, SRP Silva, JM Shannon and BJ Sealy

CARBON, Vol.37(5), pp.777-780

Symposium K on Carbon-Based Materials for Microelectronics of the European-Materials-Research-Society-Meeting (STRASBOURG, FRANCE, 16/06/1998 - 19/06/1998)

01/01/1999

DOI: https://doi.org/10.1016/S0008-6223(98)00269-3

Abstract

Science & Technology

Physical Sciences

Technology

Chemistry

Physical

Materials Science

Multidisciplinary

Chemistry

Materials Science

CHEMISTRY

PHYSICAL

MATERIALS SCIENCE

MULTIDISCIPLINARY

amorphous carbon

plasma deposition

chemical vapour deposition

annealing

electrical properties

THIN-FILMS

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Title: A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films
Creators: RUA Khan
AP Burden
SRP Silva
JM Shannon
BJ Sealy
Contributors: PERGAMON-ELSEVIER SCIENCE LTD (Publisher)
Publication Details: CARBON, Vol.37(5), pp.777-780
Conference: Symposium K on Carbon-Based Materials for Microelectronics of the European-Materials-Research-Society-Meeting (STRASBOURG, FRANCE, 16/06/1998 - 19/06/1998)
Date published: 01/01/1999
Date submitted: 17/05/2017
Identifiers: 99511730302346
Academic Unit: University of Surrey
Resource Type: Conference presentation

A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films

Abstract

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