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A comparative study of vacancies produced by proton implantation of silicon using positron annihilation and deep level transient spectroscopy
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A comparative study of vacancies produced by proton implantation of silicon using positron annihilation and deep level transient spectroscopy

MA Lourenco, AP Knights, KP Homewood, RM Gwilliam, PJ Simpson and P Mascher
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.175, pp.300-304
12th International Conference on Ion Beam Modification of Materials (IBMM2000) (CANELA, BRAZIL, 03/09/2000 - 08/09/2000)
01/04/2001

Abstract

Science & Technology Technology Physical Sciences Instruments & Instrumentation Nuclear Science & Technology Physics Atomic Molecular & Chemical Physics Nuclear Physics INSTRUMENTS & INSTRUMENTATION NUCLEAR SCIENCE & TECHNOLOGY PHYSICS ATOMIC MOLECULAR & CHEMICAL PHYSICS NUCLEAR SI PROFILES DEFECTS
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