A Demonstration using the THOR Monitor that Beam Quality Can Affect Device Yield

Conference presentation

Peer reviewed

P. Malone, W. Shull, Jonathan England and I. Fotheringham

Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994

Ion Implantation Technology 94 (IIT 94) (Catania, Italy, 13/06/1994 - 17/06/1994)

16/05/1995

Abstract

url

https://www.elsevier.com/books/ion-implantation-technology-94/coffa/978-0-444-82194-2View

Published (Version of record)

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Title: A Demonstration using the THOR Monitor that Beam Quality Can Affect Device Yield
Creators: P. Malone
W. Shull
Jonathan England
I. Fotheringham
Contributors: S. Coffa
G. Ferla
E. Rimini
F. Priolo
Publication Details: Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994
Conference: Ion Implantation Technology 94 (IIT 94) (Catania, Italy, 13/06/1994 - 17/06/1994)
Date published: 16/05/1995
Date submitted: 15/06/2017
Identifiers: 99515332102346
Academic Unit: School of Computer Science and Electronic Engineering
Resource Type: Conference presentation