Abstract
Ion beam techniques are used with ion energies from eV to many MeV and a very wide range of ion species to characterise materials at length scales from sub-nm to sub-mm and in a wide variety of different ways. Many of these techniques are non destructive. Atomic concentration can be determined from matrix elements (the stoichiometry) to minor and trace elements (at ng/g sensitivity and better), in one dimension (depth profiles), two dimensions (elemental maps), and three dimensions with full tomography being feasible. There is sensitivity to the whole Periodic Table one way or another, with nuclear techniques for isotopic sensitivity, and high resolution mass spectrometry for obtaining isotopic ratios at ultra-high sensitivities of 1014 and better. Other techniques include ultra-high resolution microscopy, characterisation of semiconductor device defects at high spacial resolution, and the investigation of damage processes in the nuclear irradiation of materials. ION BEAM METHODS for thin film materials have major application areas from archaeology to zoology (including materials science, geology, cultural heritage, electronics and many others).