MASS-TRANSPORT OF SILICON DURING ARGON IRRADIATION EMPLOYING A DOUBLE-MARKER SYSTEM

ZH JAFRI; C JEYNES; RP WEBB; IH WILSON

doi:10.1016/0168-583X(90)90160-V

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MASS-TRANSPORT OF SILICON DURING ARGON IRRADIATION EMPLOYING A DOUBLE-MARKER SYSTEM

Journal article

Peer reviewed

MASS-TRANSPORT OF SILICON DURING ARGON IRRADIATION EMPLOYING A DOUBLE-MARKER SYSTEM

ZH JAFRI, C JEYNES, RP WEBB and IH WILSON

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.48(1-4), pp.457-460

01/03/1990

DOI: https://doi.org/10.1016/0168-583X(90)90160-V

Abstract

Science & Technology

Technology

Physical Sciences

Instruments & Instrumentation

Nuclear Science & Technology

Physics

Atomic

Molecular & Chemical

Physics

Nuclear

Physics

INSTRUMENTS & INSTRUMENTATION

NUCLEAR SCIENCE & TECHNOLOGY

PHYSICS

ATOMIC

MOLECULAR & CHEMICAL

PHYSICS

NUCLEAR

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Title: MASS-TRANSPORT OF SILICON DURING ARGON IRRADIATION EMPLOYING A DOUBLE-MARKER SYSTEM
Creators: ZH JAFRI
C JEYNES
RP WEBB
IH WILSON
Publication Details: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.48(1-4), pp.457-460
Publisher: ELSEVIER SCIENCE BV
Publication Date: 01/03/1990
Identifiers: 99516706202346; WOS:A1990CX39400103
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

MASS-TRANSPORT OF SILICON DURING ARGON IRRADIATION EMPLOYING A DOUBLE-MARKER SYSTEM

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